Atom lithography without laser cooling
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Publication date
2010-03
Authors
Smeets, B.
van der Straten, Peter
Meijer, T.
Fabrie, C.G.C.H.M.
van Leeuwen, K.A.H.
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Abstract
Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.
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Smeets, B, van der Straten, P, Meijer, T, Fabrie, C G C H M & van Leeuwen, K A H 2010, 'Atom lithography without laser cooling', Applied Physics B: Lasers and Optics, vol. 98, no. 4, pp. 697-705. https://doi.org/10.1007/s00340-009-3867-3