Thermal annealing of protocrystalline a-Si:H
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2011
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Abstract
It proves difficult to obtain a set of protocrystalline silicon materials with different characteristics from the same deposition chamber to study the exact nature of these transition region materials. Hot-wire deposited protocrystalline silicon was thus isochronically annealed at different temperatures to investigate the bonded hydrogen configurations and structural disorder. Modeling of optical reflection and transmission spectra with Scout® yielded the optical parameters and infrared spectroscopy confirms that bonded hydrogen remains in the material, with the exception of a longer anneal of six hours at 520 °C. Sub bandgap absorption as inferred from photothermal deflection spectroscopy was related to these characteristics.
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Muller, T F G, Arendse, C J, Halindintwali, S, Knoesen, D & Schropp, R E I 2011, 'Thermal annealing of protocrystalline a-Si:H', Thin Solid Films, vol. 519, no. 14, pp. 4462-4465. https://doi.org/10.1016/j.tsf.2011.01.318