Colloidal assemblies modified by ion irradiation

Publication date

2001-01-01

Authors

Snoeks, E.
Blaaderen, A. van
Dillen, T. van
Kats, C.M. van
Velikov, K.P.
Brongersma, M.L.
Polman, A.

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DOI

Document Type

Article
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Abstract

Spherical SiO2 and ZnS colloidal particles show a dramatic anisotropic plastic deformation under 4 MeV Xe ion irradiation, that changes their shape into oblate into oblate ellipsional, with an aspect ratio that can be precisely controlled by the ion fluence. The 290 nm and 1.1 um diameter colloids were deposited on a Si substrate and irradiated at 90 K, using fluences in the range 3*10^(13)-8*10^(14) cm^(-2). The transverse particle diameter shows a linear increase with ion fluence, while the longitudinal diameter shrinks; the particle volume remains constant. Size aspect ratios up to 3.1 are achieved. Applications of the ion beam deformation technique are shown in studies of liquid crystalline colloidal ordening, self-assembled two-dimensional colloidal lithographic masks for thin-film deposition, and in tuning the optical properties of three-dimensional colloidal crystals.

Keywords

Colloid, Ion irradiation, Anisotropic deformation, Liquid crystal, Nanolithography, Colloidal crystal

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