Structural sensitivity of the spin Hall magnetoresistance in antiferromagnetic thin films

Publication date

2020-01-01

Authors

Ross, Andrew
Lebrun, Romain
Ulloa, CamiloISNI 0000000527796528
Grave, Daniel A.
Kay, Asaf
Rothschild, Avner
Kläui, Mathias

Editors

Advisors

Supervisors

Document Type

/dk/atira/pure/researchoutput/researchoutputtypes/workingpaper/preprint
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Abstract

Reading the magnetic state of antiferromagnetic (AFM) thin films is key for AFM spintronic devices. We investigate the underlying physics behind the spin Hall magnetoresistance (SMR) of bilayers of platinum and insulating AFM hematite ({\alpha}-Fe2O3) and report a record SMR efficiency of up to ~1%. To understand the SMR field dependence, we analyse the role of the imaginary Néel spin-mixing conductance and find it key for the SMR response of uncompensated AFM interfaces. We demonstrate that the combined real and imaginary conductances can be used as a unique tool to unambiguously determine AFM textures.

Keywords

Condensed Matter, Materials Science

Citation

Ross, A, Lebrun, R, Ulloa, C, Grave, D A, Kay, A, Rothschild, A & Kläui, M 2020 'Structural sensitivity of the spin Hall magnetoresistance in antiferromagnetic thin films' arXiv. https://doi.org/10.48550/arXiv.2001.03117