High-energy ion-beam-induced phase separation in SiOx films

Publication date

2005

Authors

Arnoldbik, W.M.
Tomozeiu, N.
van Hattum, E.D.
Lof, R.W.
Vredenberg, ArjenISNI 0000000394624684

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Article
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Citation

Arnoldbik, W M, Tomozeiu, N, van Hattum, E D, Lof, R W & Vredenberg, A M 2005, 'High-energy ion-beam-induced phase separation in SiOx films', Physical Review B - Condensed Matter and Materials Physics, vol. 71, no. 12, pp. 125329.