Surface termination and hydrogen bubble adhesion on Si(100) surfaces during anisotropic dissolution in aqueous KOH
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2006
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Haiss, W.
Raisch, P.
Bitsch, L.
Nichols, R.J.
Xia, X.
Kelly, John
Schiffrin, D.J.
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Haiss, W, Raisch, P, Bitsch, L, Nichols, R J, Xia, X, Kelly, J J & Schiffrin, D J 2006, 'Surface termination and hydrogen bubble adhesion on Si(100) surfaces during anisotropic dissolution in aqueous KOH', Journal of Electroanalytical Chemistry, vol. 597, pp. 1-12.