In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution
Publication date
2007
Authors
Philipsen, H.G.G.
Chazalviel, J.-N.
Allongue, P.
Ozanam, F.
Kelly, John
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Abstract
Fourier Transform Infrared (FTIR) spectroscopy was used to study in-situ the anodic oxidation of n-type Si(111) in KOH solution. Changes in surface chemistry were followed during oxide growth. The results are considered on the basis of a model developed from electrochemical measurements.
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Philipsen, H G G, Chazalviel, J-N, Allongue, P, Ozanam, F & Kelly, J J 2007, 'In-situ IR spectroscopy to study anodic oxidation of Si(111) in KOH solution', ECS Transactions, vol. 6, no. 2, pp. 481-488.