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Methods of Deposition of Hydrogenated Amorphous Silicon for Device Applications

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10.1.1.116.9008.pdf (2.86 MB)

Publication date

2002

Authors

van Sark, W.G.J.H.M.ORCID 0000-0002-4738-1088ISNI 0000000397039608

Editors

Francombe, M.H.

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Supervisors

DOI

https://doi.org/10.1016/B978-012512908-4/50004-7

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Part of book

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Abstract

Keywords

Taverne

Citation

van Sark, W G J H M 2002, Methods of Deposition of Hydrogenated Amorphous Silicon for Device Applications. in M H Francombe (ed.), Advances in Plasma-Grown Hydrogenated Films. Academic Press, San Diego, USA, pp. 1-215. https://doi.org/10.1016/B978-012512908-4/50004-7

URI

http://hdl.handle.net/1874/385746